Interconnect Noise Optimization in Nanometer Technologies - Mohamed Elgamel - Books - Springer-Verlag New York Inc. - 9781441938442 - October 29, 2010
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Mohamed Elgamel
Interconnect Noise Optimization in Nanometer Technologies 1st Ed. Softcover of Orig. Ed. 2006 edition

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Presents a range of CAD algorithms and techniques for synthesizing and optimizing interconnect Provides insight & intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits

160 pages, 1, black & white illustrations

Media Books     Paperback Book   (Book with soft cover and glued back)
Released October 29, 2010
ISBN13 9781441938442
Publishers Springer-Verlag New York Inc.
Pages 160
Dimensions 156 × 234 × 8 mm   ·   235 g
Language English  

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